Ετικέτες

Τρίτη 22 Μαΐου 2018

Design optimisation of C ion implantation of α-Al2O3 for medical dosimetry

Publication date: 5 September 2018
Source:Materials & Design, Volume 153
Author(s): Mini Agarwal, S.K. Garg, K. Asokan, S. Thulkar, S. Chander, M.K. Dalai, Pratik Kumar
The present work reports the fabrication and characterization of α–Al2O3:C, a highly sensitive low effective atomic number (Zeff = 10.7) OSL material for medical dosimetry, through a new approach of doping via implantation. In this study, a Single Crystalline α–Al2O3 (SCALO) and a Sapphire α–Al2O3 (SALO) are used and implanted with 100 keV of C+ at various fluences (mol%) from 2.5 × 1014 ions cm−2 (~0.04%) to 6.25 × 1015 ions cm−2 (~1%) and are pre-heated up to 220 °C. The structural, optical, morphological and luminescent studies of the Carbon doped α–Al2O3 (α–Al2O3:C) are carried out using X-ray diffraction, Ultraviolet-visible spectroscopy (UV–Vis), Photo-luminescence (PL), Time of Flight Secondary Ion Mass Spectrometry (TOF-SIMS), Optically Stimulated Luminescence (OSL), and Thermo-Luminescence (TL). The doping of ~1 mol% of C+ is found at an optimized doping level due to its high intensity of luminescence. This phenomenon is studied for heavy charged particle (HCP) dosimetry, which might prove effective for cancer treatment. It is found that α –ALO:C (both the single crystalline and the sapphire alumina) has the capability to measure large radiation doses (~kGy). This is attributed to the generation of stable defects after the incorporation of Carbon that results in a linear response with the dose and in extraordinary efficiency. Thus, this study confirms the development of α–Al2O3 by the novel approach of C+ implantation method and the findings result in an efficient medical radiation dosimeter.

Graphical abstract

image


https://ift.tt/2IHHgRf

Δεν υπάρχουν σχόλια:

Δημοσίευση σχολίου

Αναζήτηση αυτού του ιστολογίου